![]() These results were compared with the parameters of a cell without coating, one with single layer coating, and one with zero reflectance on the front surface. ![]() Moreover, about 22% conversion efficiency and 38.6 mA/cm2 short circuit current density were achieved for a silicon cell with DLARC. As a result of simulation, the reflectance on the surface was reduced from 30.2% to 2.37%. The results were compared with other works in the solar spectral range (400-1200 nm). Ti2 O3 and MgF2 were then applied in a DLARC design, taking into consideration the refractive index dispersion of the two materials. Various previous works in which solar cell efficiencies were investigated after applying double layer antireflection coating (DLARC) were reviewed. The effects of antireflection coating on electrical parameters such as the short circuit current, open circuit voltage, maximum current density, maximum voltage, maximum power, power density, and conversion efficiency of the solar cell were simulated. The proposed method would offer a low-cost and convenient way to improve the antireflective performance of transmission-diffractive elements.Īntireflection coating on silicon, a high refractive index substrate, was theoretically investigated. The simulation results were in good agreement with the experimental ones, which verified our physical comprehension and the corresponding numerical model. Results also revealed that the etching process can change the duty cycle of the grating, and thus the diffraction orders if there are oblique lateral walls. The nanostructure surface exhibited excellent antireflection performance, where the reflection of the grating surface was suppressed to zero over a wide range of incident angles. Effects of the nanostructures on the reflection and transmission properties of the grating were investigated through experiments and simulations. According to effective medium theory, random cone-shaped nanopillars which are integrated on the grating surface can act as an antireflective layer. The fabrication is a one-step self-masking reaction ion etching (RIE) process without using any masks. In this work, we propose a simple method to fabricate subwavelength structures on fused-silica transmission grating for optical antireflection. Suppression of Fresnel reflection from diffraction grating surfaces is very important for many optical configurations.
0 Comments
Leave a Reply. |
AuthorWrite something about yourself. No need to be fancy, just an overview. ArchivesCategories |